Invention Grant
- Patent Title: Acid generator compounds and photoresists comprising same
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Application No.: US15167223Application Date: 2016-05-27
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Publication No.: US10221131B2Publication Date: 2019-03-05
- Inventor: Irvinder Kaur , Cong Liu , Cheng-Bai Xu
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C309/17 ; C07D307/00 ; C07D493/18 ; C07C381/12 ; H01L21/027 ; C07C309/01 ; G03F7/039
Abstract:
Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.
Public/Granted literature
- US20160347709A1 ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME Public/Granted day:2016-12-01
Information query
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