Invention Grant
- Patent Title: Charged particle beam inclination correction method and charged particle beam device
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Application No.: US15025713Application Date: 2014-10-02
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Publication No.: US10229811B2Publication Date: 2019-03-12
- Inventor: Yuzuru Mizuhara , Hideyuki Kazumi
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2013-208415 20131003
- International Application: PCT/JP2014/076400 WO 20141002
- International Announcement: WO2015/050201 WO 20150409
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/04

Abstract:
With conventional optical axis adjustment, a charged particle beam will not be perpendicularly incident to a sample, affecting the measurements of a pattern being observed. Highly precise measurement and correction of a microscopic inclination angle are difficult. Therefore, in the present invention, in a state where a charged particle beam is irradiated toward a sample, a correction of the inclination of the charged particle beam toward the sample is performed on the basis of secondary electron scanning image information from a reflector plate. From the secondary electron scanning image information, a deviation vector for charged particle beam deflectors is adjusted, causing the charged particle beam to be perpendicularly incident to the sample. At least two stages of charged particle beam deflectors are provided.
Public/Granted literature
- US20160217969A1 Charged Particle Beam Inclination Correction Method and Charged Particle Beam Device Public/Granted day:2016-07-28
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