An infrared projector and an infrared observation system by which unevenness of wavelengths in a projection pattern is reduced are provided. An infrared projector (100) is provided with infrared semiconductor laser elements (11a to 11d) that emit near-infrared laser light beams (L1a, L1b, L1c, and L1d), a scattering member (51) that receives and scatters the near-infrared laser light beams, and a projecting member (61) that projects the near-infrared laser light beams scattered by the scattering member.