Invention Grant
- Patent Title: Hollow cathode ion source
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Application No.: US14975286Application Date: 2015-12-18
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Publication No.: US10242846B2Publication Date: 2019-03-26
- Inventor: John Chambers , Peter Maschwitz
- Applicant: AGC Flat Glass North America, Inc. , Asahi Glass Co., Ltd. , AGC Glass Europe
- Applicant Address: US GA Alpharetta JP Tokyo BE Louvain-la Neuve
- Assignee: AGC FLAT GLASS NORTH AMERICA, INC.,ASAHI GLASS CO., LTD.,AGC GLASS EUROPE
- Current Assignee: AGC FLAT GLASS NORTH AMERICA, INC.,ASAHI GLASS CO., LTD.,AGC GLASS EUROPE
- Current Assignee Address: US GA Alpharetta JP Tokyo BE Louvain-la Neuve
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J37/32

Abstract:
An ion source includes a chamber. The ion source further includes a first hollow cathode having a first hollow cathode cavity and a first plasma exit orifice and a second hollow cathode having a second hollow cathode cavity and a second plasma exit orifice. The first and second hollow cathodes are disposed adjacently in the chamber. The ion source further includes a first ion accelerator between and in communication with the first plasma exit orifice and the chamber. The first ion accelerator forms a first ion acceleration cavity. The ion source further includes a second ion accelerator between and in communication with the second plasma orifice and the chamber. The second ion accelerator forms a second ion acceleration cavity. The first hollow cathode and the second hollow cathode are configured to alternatively function as electrode and counter-electrode to generate a plasma. Each of the first ion acceleration cavity and the second ion acceleration cavity are sufficient to enable the extraction and acceleration of ions.
Public/Granted literature
- US20170178869A1 HOLLOW CATHODE ION SOURCE Public/Granted day:2017-06-22
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