Invention Grant
- Patent Title: Semiconductor layer including compositional inhomogeneities
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Application No.: US15687606Application Date: 2017-08-28
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Publication No.: US10243100B2Publication Date: 2019-03-26
- Inventor: Michael Shur , Rakesh Jain , Maxim S. Shatalov , Alexander Dobrinsky , Jinwei Yang , Remigijus Gaska , Mikhail Gaevski
- Applicant: Sensor Electronic Technology, Inc.
- Applicant Address: US SC Columbia
- Assignee: Sensor Electronic Technology, Inc.
- Current Assignee: Sensor Electronic Technology, Inc.
- Current Assignee Address: US SC Columbia
- Agency: LaBatt, LLC
- Main IPC: H01L33/06
- IPC: H01L33/06 ; H01L33/00 ; H01L33/18 ; H01L33/38 ; H01S5/022 ; H01L33/30 ; H01S5/343 ; H01S5/32 ; H01S5/34

Abstract:
A device comprising a semiconductor layer including a plurality of compositional inhomogeneous regions is provided. The difference between an average band gap for the plurality of compositional inhomogeneous regions and an average band gap for a remaining portion of the semiconductor layer can be at least thermal energy. Additionally, a characteristic size of the plurality of compositional inhomogeneous regions can be smaller than an inverse of a dislocation density for the semiconductor layer.
Public/Granted literature
- US20170373222A1 Semiconductor Layer Including Compositional Inhomogeneities Public/Granted day:2017-12-28
Information query
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