- Patent Title: Transfer film, method for manufacturing same, method for manufacturing laminate, method for manufacturing capacitance-type input device, and method for manufacturing image display device
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Application No.: US15484302Application Date: 2017-04-11
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Publication No.: US10254906B2Publication Date: 2019-04-09
- Inventor: Hidenori Gotoh , Morimasa Sato
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Minato-Ku, Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Minato-Ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-217274 20141024
- Main IPC: G06F3/044
- IPC: G06F3/044 ; B41M5/00 ; B41M1/34 ; B32B27/00 ; B32B27/36 ; B32B33/00 ; B05D3/02 ; B32B37/00
Abstract:
The transfer film includes a temporary support, a resin layer, and a cover film in this order, in which when the cover film is peeled from the resin layer, a surface of the cover film that contacted the resin layer has surface roughnesses SRz and SRa of equal to or less than 130 nm and equal to or less than 8 nm respectively that are measured based on JIS-B0601-2001.
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