Invention Grant
- Patent Title: Illumination source for an inspection apparatus, inspection apparatus and inspection method
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Application No.: US15641579Application Date: 2017-07-05
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Publication No.: US10267744B2Publication Date: 2019-04-23
- Inventor: Patricius Aloysius Jacobus Tinnemans , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP16178048 20160705; EP16181778 20160728
- Main IPC: G02F1/35
- IPC: G02F1/35 ; G01N21/47 ; G01N21/88 ; G01N21/956 ; G03F7/20
Abstract:
Disclosed is an illumination source for generating measurement radiation for an inspection apparatus. The source generates at least first measurement radiation and second measurement radiation such that the first measurement radiation and the second measurement radiation interfere to form combined measurement radiation modulated with a beat component. The illumination source may be a HHG source. Also disclosed is an inspection apparatus comprising such a source and an associated inspection method.
Public/Granted literature
- US20180011029A1 Illumination Source for an Inspection Apparatus, Inspection Apparatus and Inspection Method Public/Granted day:2018-01-11
Information query
