Invention Grant
- Patent Title: Resin composition, copper paste, and semiconductor device
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Application No.: US15750866Application Date: 2016-07-27
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Publication No.: US10276277B2Publication Date: 2019-04-30
- Inventor: Tomoyuki Takahashi
- Applicant: NAMICS CORPORATION
- Applicant Address: JP Niigata
- Assignee: NAMICS CORPORATION
- Current Assignee: NAMICS CORPORATION
- Current Assignee Address: JP Niigata
- Agency: Rankin, Hill & Clark LLP
- Priority: JP2015-161608 20150819
- International Application: PCT/JP2016/071984 WO 20160727
- International Announcement: WO2017/029953 WO 20170223
- Main IPC: H01B1/22
- IPC: H01B1/22 ; C09D5/24 ; C09J9/02 ; C09J161/06 ; H01L23/00 ; H05K1/09

Abstract:
An object of the present invention is to provide a resin composition suitable for copper pastes, which can be cured in an ambient atmosphere and has a viscosity within an appropriate range and a low specific resistance after curing. This resin composition includes (A) a copper powder, (B) a thermosetting resin, (C) a fatty acid, (D) an amine, and (E) 4-aminosalicylic acid. Preferably, the (B) component is resol-type phenolic resin. More preferably, the (C) component is at least one selected from oleic acid, linoleic acid, linolenic acid, stearic acid, palmitic acid, lauric acid, butyric acid, and propionic acid.
Public/Granted literature
- US20180233248A1 RESIN COMPOSITION, COPPER PASTE, AND SEMICONDUCTOR DEVICE Public/Granted day:2018-08-16
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