Invention Grant
- Patent Title: Metamaterial structure and method of fabricating the same
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Application No.: US15671922Application Date: 2017-08-08
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Publication No.: US10310141B2Publication Date: 2019-06-04
- Inventor: Sunghoon Hong , Heon Lee , Yong Suk Yang , In-Kyu You , Soo-Jung Kim , Hak-Jong Choi
- Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE , KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- Applicant Address: KR Daejeon KR Seoul
- Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE,KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- Current Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE,KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION
- Current Assignee Address: KR Daejeon KR Seoul
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2016-0101507 20160809
- Main IPC: B32B3/02
- IPC: B32B3/02 ; G02B1/00
Abstract:
A metamaterial structure may include a first nanoparticle and a second nanoparticle containing a different material from the first nanoparticle. The first and second nanoparticles may be provided to be adjacent to each other and to be in an electrically-coupled state.
Public/Granted literature
- US20180045856A1 METAMATERIAL STRUCTURE AND METHOD OF FABRICATING THE SAME Public/Granted day:2018-02-15
Information query
