Invention Grant
- Patent Title: Positioning device, lithographic apparatus and device manufacturing method
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Application No.: US15776995Application Date: 2016-11-17
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Publication No.: US10310392B2Publication Date: 2019-06-04
- Inventor: Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Engelbertus Antonius Fransiscus Van Der Pasch
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Priority: EP15195812 20151123
- International Application: PCT/EP2016/077947 WO 20161117
- International Announcement: WO2017/089214 WO 20170601
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A positioning device comprising an object table and a positioning module configured to position the object table. The positioning module comprises a first positioning module member configured to hold the object table, a second positioning module member configured to support the first positioning module member, and a support frame configured to support the second positioning module member. The positioning module also includes one or more actuators, a position measurement system configured to measure a position of the object table, and a control unit configured to control a position of the object table based on the measured position of the object table. The control unit is further configured to control a vertical position of the second position module member so as to maintain a top surface of the second positioning module member substantially parallel to a bottom surface of the first positioning module member.
Public/Granted literature
- US20180335705A1 POSITIONING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2018-11-22
Information query
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