Invention Grant
- Patent Title: Multi electron beam inspection apparatus
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Application No.: US15507661Application Date: 2015-09-03
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Publication No.: US10312052B2Publication Date: 2019-06-04
- Inventor: Pieter Kruit
- Applicant: TECHNISCHE UNIVERSITEIT DELFT
- Applicant Address: NL
- Assignee: TECHNISCHE UNIVERSITEIT DELFT
- Current Assignee: TECHNISCHE UNIVERSITEIT DELFT
- Current Assignee Address: NL
- Agency: Hayes Soloway P.C.
- Priority: NL2013411 20140904
- International Application: PCT/NL2015/050610 WO 20150903
- International Announcement: WO2016/036246 WO 20160310
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/04

Abstract:
Provided is an assembly for inspecting the surface of a sample. The assembly includes two or more multi-beam electron column units. Each unit has: a single thermal field emitter for emitting a diverging electron beam towards a beam splitter; wherein the beam splitter includes a first multi-aperture plate having multiple apertures for creating multiple primary electron beams; a collimator lens for collimating the diverging electron beam from the emitter; an objective lens unit for focusing said multiple primary electron beams on said sample; and a multi-sensor detector system for separately detecting the intensity of secondary electron beams created by each one of said focused primary electron beams on said sample. The two or more multi-beam electron column units are arranged adjacent to each other for inspecting different parts of the surface of the sample at the same time.
Public/Granted literature
- US20170243717A1 MULTI ELECTRON BEAM INSPECTION APPARATUS Public/Granted day:2017-08-24
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