Invention Grant
- Patent Title: Multi charged particle beam writing apparatus, and multi charged particle beam writing method
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Application No.: US15790115Application Date: 2017-10-23
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Publication No.: US10319564B2Publication Date: 2019-06-11
- Inventor: Hiroshi Matsumoto
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-209987 20161026
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/302

Abstract:
A multi charged particle beam writing apparatus includes an irradiation time calculation circuit to calculate an irradiation time of a beam to each pixel, for each of a plurality of pixels which are obtained by dividing a writing region of a target object and each of which serves as an irradiation unit region per beam of multi charged particle beams, a gray-scale value calculation circuit to calculate, for each pixel, a gray-scale value of gradation by gray scale levels by dividing the irradiation time by a quantization unit, and a gray-scale value correction circuit to correct, for each of a plurality of groups each composed of adjacent pixels, dose errors each caused by gradation, by gray scale levels, of the irradiation time which occur in the adjacent pixels in a group concerned, by increasing or decreasing the gray-scale value of at least one pixel in the group concerned by 1.
Public/Granted literature
- US20180114673A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2018-04-26
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