Invention Grant
- Patent Title: Oxidative volumetric expansion of metals and metal containing compounds
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Application No.: US15621120Application Date: 2017-06-13
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Publication No.: US10319624B2Publication Date: 2019-06-11
- Inventor: Susmit Singha Roy , Yihong Chen , Kelvin Chan , Abhijit Basu Mallick , Srinivas Gandikota , Pramit Manna
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/762
- IPC: H01L21/762 ; H01L21/28 ; H01L21/32 ; H01L21/8234 ; H01L29/43
Abstract:
Methods comprising forming a film on at least one feature of a substrate surface are described. The film is expanded to fill the at least one feature and cause growth of the film from the at least one feature. Methods of forming self-aligned vias are also described.
Public/Granted literature
- US20170358483A1 Oxidative Volumetric Expansion Of Metals And Metal Containing Compounds Public/Granted day:2017-12-14
Information query
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