Hybrid-channel nano-sheets FETs
Abstract:
Integrated chips include a first device and a second device. The first device includes a stack of vertically arranged sheets of a first channel material, a source and drain region having a first dopant type, and a first work function metal layer formed from a first work function metal. The second device includes a stack of vertically arranged sheets of a second channel material, a source and drain region having a second dopant type, and a second work function metal layer formed from a second work function metal.
Public/Granted literature
Information query
Patent Agency Ranking
0/0