Invention Grant
- Patent Title: Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method
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Application No.: US15694398Application Date: 2017-09-01
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Publication No.: US10338401B2Publication Date: 2019-07-02
- Inventor: Gerbrand Van Der Zouw , Martin Jacobus Johan Jak , Martin Ebert
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP14178791 20140728; EP14191958 20141105
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G02B27/28 ; G02F1/01 ; G01J1/08 ; G01N21/88 ; G01N21/95 ; G03F7/20

Abstract:
In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first spatial light modulator (236-S) varies a polarization state of the first radiation in accordance with a first programmable pattern. Second spatial light modulator (236-P) varies a polarization state of the second radiation accordance with a second programmable pattern. A polarizing beam splitter (234) selectively transmits each of the spatially modulated first and second radiation to a common output path, depending on the polarization state of the radiation. In an embodiment, functions of pre-polarizers are performed by the polarizing beam splitter.
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