Invention Grant
- Patent Title: Imprint device and imprint method
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Application No.: US14407510Application Date: 2013-08-23
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Publication No.: US10343312B2Publication Date: 2019-07-09
- Inventor: Hirosuke Kawaguchi , Tatsuya Hagino , Satoru Tanaka
- Applicant: SCIVAX CORPORATION
- Applicant Address: JP Kanagawa
- Assignee: SCIVAX CORPORATION
- Current Assignee: SCIVAX CORPORATION
- Current Assignee Address: JP Kanagawa
- Agency: Schroeder Intellectual Property Law Group, LLC
- Priority: JP2012-186133 20120827
- International Application: PCT/JP2013/072620 WO 20130823
- International Announcement: WO2014/034576 WO 20140306
- Main IPC: B29C59/02
- IPC: B29C59/02 ; B29C43/10 ; B29D11/00 ; B29C43/12 ; B82Y40/00 ; G03F7/00 ; B29C43/36 ; B29C43/02 ; B29C43/32 ; B29C51/28

Abstract:
An imprint device and an imprint method which form mold patterns on both surfaces of a molding target. An imprint device transfers mold patterns on both surfaces of a molding target using flexible first and second dies and includes first and second casings which each apply pressure of first and second pressurizing rooms respectively, to the first and second dies respectively and the molding target, a pressurizer that adjusts the pressures of the pressurizing rooms, first and second moving units that move the first and second dies respectively and the molding target in a direction coming close to or distant from each other, a depressurizer that depressurizes a depressurizing room formed between the first and second casings, and eliminates fluids present between the dies and the molding target, and a pressure adjuster that adjusts pressures to reduce pressure differences between the depressurizing room and the pressurizing rooms.
Public/Granted literature
- US20150158239A1 IMPRINT DEVICE AND IMPRINT METHOD Public/Granted day:2015-06-11
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