Invention Grant
- Patent Title: Conductive copper paste, conductive copper paste cured film, and semiconductor device
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Application No.: US15555319Application Date: 2016-02-29
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Publication No.: US10347388B2Publication Date: 2019-07-09
- Inventor: Masashi Kajita , Takashi Sakamoto , Shigeko Konno , Tomoyuki Takahashi
- Applicant: NAMICS CORPORATION
- Applicant Address: JP Niigata
- Assignee: NAMICS CORPORATION
- Current Assignee: NAMICS CORPORATION
- Current Assignee Address: JP Niigata
- Agency: Rankin, Hill & Clark LLP
- Priority: JP2015-043245 20150305
- International Application: PCT/JP2016/056042 WO 20160229
- International Announcement: WO2016/140185 WO 20160909
- Main IPC: C09D11/52
- IPC: C09D11/52 ; H01B1/22 ; H01B5/14 ; H01B13/00 ; H01L23/00 ; H05K3/32

Abstract:
The purpose of the present invention is to provide a conductive copper paste which is curable in an ambient atmosphere, has a long pot life, and, has a low specific resistance even under a high-temperature and short-time curing condition, wherein the specific resistance after curing does not greatly vary depending on a copper powder content. The conductive copper paste provided is characterized by containing (A) a copper powder, (B) a thermosetting resin, (C) a fatty acid that is liquid at normal temperature, and (D) triethanolamine. Preferably, component (B) is a resol-type phenol resin. More preferably, the content of component (B) is 10 to 20 parts by mass with respect to a total of 100 parts by mass of component (A) and component (B).
Public/Granted literature
- US20180061520A1 CONDUCTIVE COPPER PASTE, CONDUCTIVE COPPER PASTE CURED FILM, AND SEMICONDUCTOR DEVICE Public/Granted day:2018-03-01
Information query
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