Invention Grant
- Patent Title: Beam dump apparatus, laser apparatus equipped with the beam dump apparatus, and extreme ultraviolet light generating apparatus
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Application No.: US15642745Application Date: 2017-07-06
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Publication No.: US10401615B2Publication Date: 2019-09-03
- Inventor: Yoshiaki Kurosawa , Takashi Suganuma
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Main IPC: G02B26/02
- IPC: G02B26/02 ; H05G2/00 ; G02B27/14 ; G21K1/06 ; H01S3/23 ; H01S3/10 ; H01S3/00

Abstract:
A beam dump apparatus may include: an attenuator module; a beam dump module; and a control unit. The attenuator module includes: a first beam splitter provided inclined with respect to the optical axis of a laser beam at a first angle; a second beam splitter provided inclined with respect to the optical axis at a second angle; a first beam dumper provided such that the laser beam from the first beam splitter enters thereinto; a second beam dumper provided such that the laser beam from the second beam splitter enters thereinto; and a first stage that causes the beam splitters to advance into and retreat from the optical path. The beam dump module includes: a mirror; a third beam dumper provided such that the laser beam from the mirror enters thereinto; and a second stage that causes the mirror to advance into and retreat from the optical path.
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