Invention Grant
- Patent Title: Photosensitive composition, image forming method, film forming method, resin, image, and film
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Application No.: US15890371Application Date: 2018-02-07
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Publication No.: US10407531B2Publication Date: 2019-09-10
- Inventor: Noriaki Sato , Shota Suzuki , Yasuhiro Sawamura , Sean Slater
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Solaris Intellectual Property Group, PLLC
- Priority: JP2015-167974 20150827
- Main IPC: C08F2/46
- IPC: C08F2/46 ; C08F2/50 ; C08G61/04 ; C08F265/06 ; B41J2/01 ; C08F2/44 ; C08F220/34 ; C09D11/30 ; B05D3/06 ; B41J11/00 ; B41M5/00 ; B41M7/00 ; C09D11/101 ; C09D11/107 ; C09D11/322

Abstract:
Provided are a photosensitive composition containing a resin which includes a structural unit A represented by Formula (1) or (2) and a structural unit B represented by Formula (3), (4), or (5); and a radically polymerizable monomer, an image forming method, a film forming method, a resin, an image, and a film. R11, R21, R31, R41, and R51 represent H or a hydrocarbon group, R12 to R14 and R22 to R24 represent a hydrocarbon group, H, or an OH group, R42, R43, R52, and R53 represent H or a hydrocarbon group, L1 to L3 represent a single bond or a linking group, X1 represents —O— or —NR15—, X2 represent —O— or —NR25—, R15 and R25 represent H or a hydrocarbon group, and Cy1 represents a hydrocarbon group which may contain O and has a cyclic structure.
Public/Granted literature
- US20180162979A1 PHOTOSENSITIVE COMPOSITION, IMAGE FORMING METHOD, FILM FORMING METHOD, RESIN, IMAGE, AND FILM Public/Granted day:2018-06-14
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