Invention Grant
- Patent Title: Field emission device and reforming treatment method
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Application No.: US16311985Application Date: 2017-03-16
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Publication No.: US10424457B2Publication Date: 2019-09-24
- Inventor: Daizo Takahashi , Michihiro Hatanaka
- Applicant: MEIDENSHA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: MEIDENSHA CORPORATION
- Current Assignee: MEIDENSHA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP2016-124149 20160623
- International Application: PCT/JP2017/010550 WO 20170316
- International Announcement: WO2017/221478 WO 20171228
- Main IPC: H01J35/06
- IPC: H01J35/06 ; H01J1/304 ; H01J9/50

Abstract:
Emitter (3) and target (7) are arranged so as to face each other in vacuum chamber (1), and guard electrode (5) is provided at outer circumferential side of electron generating portion (31) of emitter (3). Emitter (3) is supported movably in both end directions of vacuum chamber (1) by emitter supporting unit (4) having movable body (40). To perform regeneration process of guard electrode (5), emitter is moved to no-discharge position by operating emitter supporting unit, and state in which field emission of electron generating portion (31) is suppressed is set, then by applying voltage across guard electrode (5), discharge is repeated. After regeneration process, by operating emitter supporting unit again, emitter is moved to discharge position, and state in which field emission of electron generating portion (31) is possible is set with movement of movable body (40) toward the other and side being restrained by movement restraining unit (6).
Public/Granted literature
- US20190214215A1 FIELD EMISSION DEVICE AND REFORMING TREATMENT METHOD Public/Granted day:2019-07-11
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