Invention Grant
- Patent Title: Method and apparatus for precleaning a substrate surface prior to epitaxial growth
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Application No.: US15627149Application Date: 2017-06-19
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Publication No.: US10428441B2Publication Date: 2019-10-01
- Inventor: Christopher S. Olsen , Theresa K. Guarini , Jeffrey Tobin , Lara Hawrylchak , Peter Stone , Chi Wei Lo , Saurabh Chopra
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: C30B25/18
- IPC: C30B25/18 ; C30B29/06 ; C30B29/08
Abstract:
Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
Public/Granted literature
- US20180016705A1 METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO EPITAXIAL GROWTH Public/Granted day:2018-01-18
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