Invention Grant
- Patent Title: Hot vacuum drying device applied for flexible substrate
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Application No.: US15506238Application Date: 2016-12-29
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Publication No.: US10446417B2Publication Date: 2019-10-15
- Inventor: Chun Zhang
- Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Wuhan, Hubei
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Wuhan, Hubei
- Agent Leong C. Lei
- International Application: PCT/CN2016/113030 WO 20161229
- International Announcement: WO2018/113015 WO 20180628
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L51/56 ; B05D3/02 ; H01L21/687 ; H01L51/00

Abstract:
The present invention provides a hot vacuum drying device applied for a flexible substrate. By respectively improving the first support pin (5) and the second support pin (6) of the hot vacuum drying device to be an insertion structure or a layer jacket structure, which can accelerate heat conduction to make a temperature difference between a contact part of the substrate (7) with the first support pin (5) or the second support pin (6) and a non-contact part of the substrate (7) with the first support pin (5) or the second support pin (6) decrease and to make heating uniform, and thus to reduce pin muras caused by the support pins, and to allow an appropriate increase in the amount of the support pins in a middle zone for reducing the film unevenness due to sagging of the substrate.
Public/Granted literature
- US20180218923A1 HOT VACUUM DRYING DEVICE APPLIED FOR FLEXIBLE SUBSTRATE Public/Granted day:2018-08-02
Information query
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