Invention Grant
- Patent Title: Compound, photopolymerization initiator comprising said compound, and photosensitive resin composition containing said photopolymerization initiator
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Application No.: US15781623Application Date: 2016-12-07
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Publication No.: US10508078B2Publication Date: 2019-12-17
- Inventor: Kiwamu Terada , Kazuyoshi Yamamoto , Koji Arimitsu
- Applicant: TOKYO UNIVERSITY OF SCIENCE FOUNDATION , NIPPON KAYAKU KABUSHIKI KAISHA
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: TOKYO UNIVERSITY OF SCIENCE FOUNDATION,NIPPON KAYAKU KABUSHIKI KAISHA
- Current Assignee: TOKYO UNIVERSITY OF SCIENCE FOUNDATION,NIPPON KAYAKU KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JP2015-240433 20151209; JP2016-126097 20160624
- International Application: PCT/JP2016/086401 WO 20161207
- International Announcement: WO2017/099130 WO 20170615
- Main IPC: C07C271/24
- IPC: C07C271/24 ; C08F2/50 ; G03F7/031 ; C07C269/02 ; C08K5/205 ; C08L63/00 ; G03F7/20 ; G03F7/004 ; G03F7/038

Abstract:
The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): (wherein R1 to R6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).
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