Invention Grant
- Patent Title: Method of liquid filter wetting
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Application No.: US15661551Application Date: 2017-07-27
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Publication No.: US10525416B2Publication Date: 2020-01-07
- Inventor: Hoyoung Kang , Anton deVilliers , Corey Lemley
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood Herron & Evans LLP
- Main IPC: B01D19/00
- IPC: B01D19/00 ; B01D65/02 ; B01D71/36 ; B01D71/56 ; B01D63/14 ; B01D63/06 ; B01D29/01 ; B01D29/11 ; B01D65/00

Abstract:
A process is disclosed for wetting a filter cartridge used to treat a liquid solvent used in semiconductor manufacture. In the process, a filter cartridge having void spaces wherein the void spaces contain residual gas from the manufacturing process used to make the filter cartridge is connected to a source of purging gas. The purging gas is flowed through the filter cartridge to at least partially displace at least a portion of the residual gas from the manufacturing process used to make the filter cartridge. Next, liquid solvent is pumped through the filter cartridge so that the purging gas dissolves into the liquid solvent and to at least partially fill the void spaces to thereby at least partially wet out the filter cartridge with the liquid solvent.
Public/Granted literature
- US20180333680A1 METHOD OF LIQUID FILTER WETTING Public/Granted day:2018-11-22
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