Invention Grant
- Patent Title: Substrate on which multiple nanogaps are formed, and manufacturing method therefor
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Application No.: US15513597Application Date: 2015-09-24
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Publication No.: US10527494B2Publication Date: 2020-01-07
- Inventor: Sung Gyu Park , Jung Heum Yun , Dong Ho Kim , Byung Jin Cho , Jung Dae Kwon , Chae Won Mun
- Applicant: Korea Institute of Machinery & Materials
- Applicant Address: KR Daejeon
- Assignee: Korea Intitute of Machinery & Materials
- Current Assignee: Korea Intitute of Machinery & Materials
- Current Assignee Address: KR Daejeon
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2014-0129531 20140926; KR10-2014-0129535 20140926; KR10-2014-0129554 20140926; KR10-2014-0129574 20140926; KR10-2014-0130608 20140929; KR10-2014-0130612 20140929
- International Application: PCT/KR2015/010066 WO 20150924
- International Announcement: WO2016/048053 WO 20160331
- Main IPC: G01J3/44
- IPC: G01J3/44 ; G01N21/65
Abstract:
The present disclosure relates to a substrate with multiple nano-gaps and a manufacturing method therefor, and more particularly to a multiple nano-gaps substrate with high absorption and capable of using light sources in a wide range, and a manufacturing method therefor.
Public/Granted literature
- US20180231418A1 Substrate On Which Multiple Nanogaps Are Formed, And Manufacturing Method Therefor Public/Granted day:2018-08-16
Information query
