Invention Grant
- Patent Title: Imprint lithography method, master template for imprint, wire grid polarizer manufactured using the master template and display substrate having the same
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Application No.: US16176297Application Date: 2018-10-31
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Publication No.: US10527933B2Publication Date: 2020-01-07
- Inventor: Seung-Won Park , Taewoo Kim , Lei Xie , Daehwan Jang , Dae-Young Lee , Gugrae Jo
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2016-0061705 20160519
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G02F1/00 ; G02B5/30 ; G02F1/1335 ; G03F1/60 ; G03F1/80 ; H01L27/12 ; G02B5/00
Abstract:
A wire grid polarizer includes a base substrate, a wire grid pattern, a first stitch line extending in a first direction, and a second stitch line extending in a second direction which crosses the first direction, and including a first portion and a second portion which are discontinuous from each other, in which the wire grid pattern is evenly formed on all of the base substrate except where the first and second stitch lines exist, and the first and second stitch lines are where the wire grid pattern is unevenly formed.
Public/Granted literature
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