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公开(公告)号：US10281817B2
公开(公告)日：2019-05-07
申请号：US15620704
申请日：2017-06-12
Applicant: Samsung Display Co., Ltd.
Inventor： Taewoo Kim , Eunjung Kim , Seung-Won Park , Daehwan Jang , Hyungbin Cho , Gugrae Jo
Abstract: A method of manufacturing an imprint master template including forming a first layer pattern only in a partial region and a second layer formed in the entire region, and then a back exposure process is performed.
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公开(公告)号：US20180088461A1
公开(公告)日：2018-03-29
申请号：US15620704
申请日：2017-06-12
Applicant: Samsung Display Co., Ltd.
Inventor： Taewoo KIM , Eunjung Kim , Seung-Won Park , Daehwan Jang , Hyungbin Cho , Gugrae Jo
CPC classification number: G03F7/0002 , G03F7/0035 , G03F7/038 , G03F7/094 , G03F7/095 , G03F7/16 , G03F7/22 , G03F7/26
Abstract: A method of manufacturing an imprint master template including forming a first layer pattern only in a partial region and a second layer formed in the entire region, and then a back exposure process is performed.
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3.发明授权公开(公告)号：US10773427B2
公开(公告)日：2020-09-15
申请号：US15652184
申请日：2017-07-17
Applicant: Samsung Display Co., Ltd.
Inventor： Daehwan Jang , Seung-Won Park , Baehyoun Jung , Eunjung Kim , Jihun Kim , Yunjong Yeo , Hyungbin Cho , Sang-Hoon Lee , Yong-Hwan Ryu , Sung-Young Choi , Hyunju Kang
Abstract: A method of manufacturing a roll type imprint master mold including disposing a base layer on a substrate including a first area and a second area adjacent to the first area, disposing an inorganic insulation layer on the base layer, forming a first mask pattern and a first resin pattern in the first area, forming a pattern layer by etching the inorganic insulation layer using the first resin and the first mask patterns as a mask, removing the first resin and the first mask patterns, forming a second mask pattern and a second resin pattern in the second area, forming a pattern layer by etching the inorganic insulation layer using the second resin and the second mask patterns as a mask, removing the second resin and the second mask patterns, separating the base layer from the substrate, and attaching the base layer onto a roll body.
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公开(公告)号：US09989845B2
公开(公告)日：2018-06-05
申请号：US14991828
申请日：2016-01-08
Applicant: Samsung Display Co., Ltd.
Inventor： Seung-Won Park , Dae-Hwan Jang , Min-Uk Kim , Jung-Gun Nam , Dae-Young Lee , Gug-Rae Jo
CPC classification number: G03F7/0002 , B81C2201/015
Abstract: An exemplary embodiment discloses an imprint lithography method including: forming a first imprint pattern on a base substrate in a first area; forming a first resist pattern on the base substrate in a second area, the second area partially overlapping the first area; etching a third area using the first imprint pattern and the first resist pattern as an etch barrier, wherein the third area is a portion of the first area that is not overlapped with the second area; removing the first imprint pattern and the first resist pattern; forming a second imprint pattern on the base substrate in a fourth area which overlaps the second area and partially overlaps the third area; forming a second resist pattern on the base substrate in the third area; and etching the second area using the second imprint pattern and the second resist pattern as an etch barrier.
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5.发明授权公开(公告)号：US09269754B2
公开(公告)日：2016-02-23
申请号：US14467172
申请日：2014-08-25
Applicant: Samsung Display Co., Ltd.
Inventor： Baek-Hee Lee , Seung-Won Park , Won-Sang Park
CPC classification number: H01L27/3246 , H01L51/5209 , H01L51/5218 , H01L51/5256 , H01L51/5268 , H01L51/56
Abstract: An organic light-emitting display apparatus includes a substrate, a first electrode disposed on the substrate, a pixel-defining layer which is disposed on the substrate and the first electrode and in which an opening which exposes a central part of the first electrode is defined, an interlayer which is disposed on the first electrode and comprises an organic light-emitting layer; and a second electrode disposed on the interlayer, where a sidewall of the opening comprises a bumpy structure in which a plurality of bumps is disposed.
Abstract translation: 有机发光显示装置包括基板，设置在基板上的第一电极，设置在基板上的像素限定层和第一电极，其中限定了露出第一电极的中心部分的开口 ，中间层，其设置在所述第一电极上并且包括有机发光层; 以及设置在所述中间层上的第二电极，其中所述开口的侧壁包括其中设置有多个凸块的颠簸结构。
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Patent Agency Ranking
公开(公告)号：US10139726B2
公开(公告)日：2018-11-27
申请号：US15594645
申请日：2017-05-14
Applicant: Samsung Display Co., Ltd.
Inventor： Seung-Won Park , Taewoo Kim , Lei Xie , Daehwan Jang , Dae-Young Lee , Gugrae Jo
Abstract: An imprint lithography method includes forming a first imprint pattern on a substrate in a first area and a third area, wherein the third area is spaced apart from the first area, forming a first resist pattern on the substrate on a second area, wherein the second area is adjacent the first and third areas, forming a first pattern in the first and third areas by etching an element under the first imprint pattern using the first imprint pattern and the first resist pattern as an etch barrier, forming a second imprint pattern on the substrate in a second area, forming a second resist pattern on the substrate on the first area and the third area, and forming a second pattern in the second area by etching an element under the second imprint pattern using the second imprint pattern and the second resist pattern as an etch barrier.
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公开(公告)号：US09910201B2
公开(公告)日：2018-03-06
申请号：US15243702
申请日：2016-08-22
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Seung-Won Park , Taewoo Kim , Moongyu Lee , Minhyuck Kang
IPC: H01L21/00 , G02B5/30 , G02B1/12 , G02F1/1335
CPC classification number: G02B5/3058 , G02B1/12 , G02F1/133536 , G02F2001/133548
Abstract: A manufacturing method of a mother substrate assembly includes forming a metal layer on substantially an entire surface of a transparent substrate including a cell area including a non-display area and a display area, an align key area, and a substrate area surrounding the cell area and the align key area, etching the metal layer to form an align key in the align key area, etching the metal layer to form a reflection part in the non-display area, and etching the metal layer in the display area to form a metal nanowire in the display area.
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公开(公告)号：US20180052348A1
公开(公告)日：2018-02-22
申请号：US15668312
申请日：2017-08-03
Applicant: Samsung Display Co., Ltd.
Inventor： Seung-Won Park , Eunjung KIM , Taewoo KIM , Jung Gun NAM , Daehwan JANG , Hyungbin CHO , Gugrae JO
IPC: G02F1/1333 , G02F1/1337
CPC classification number: G02F1/13336 , G02F1/133345 , G02F1/133512 , G02F1/133707 , G02F1/133788 , G02F2001/133322 , G02F2001/133548 , G02F2001/1635
Abstract: A liquid crystal display apparatus includes a first substrate, a second substrate spaced from the first substrate, and a liquid crystal layer disposed between the first substrate and the second substrate. The first substrate includes a first base substrate, a wire grid polarizer disposed on the first base substrate, and a first alignment layer disposed on the first base substrate and including photo-alignment material, wherein the first alignment layer includes a first area in which photo-alignment is performed and a second area in which photo-alignment is not performed. A method of manufacturing the apparatus is also disclosed.
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公开(公告)号：US09725550B2
公开(公告)日：2017-08-08
申请号：US14962183
申请日：2015-12-08
Applicant: Samsung Display Co., Ltd. , KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION , Sogang University Research Foundation
Inventor： Min Hyuck Kang , Su Mi Lee , Myung Im Kim , Tae Woo Kim , Seung-Won Park , Xie Lei , Na Na Kang , Bong-Jin Moon , Joona Bang , Sang Hoon Woo , Jin Yeong Lee , Hyun Jung Jung , June Huh
IPC: C08F299/02 , C08F293/00 , C08G61/08 , C08F299/00
CPC classification number: C08F299/024 , C08F293/00 , C08G61/08 , C08G2261/1424 , C08G2261/1426 , C08G2261/3324 , C08G2261/418 , C08G2261/74
Abstract: A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.
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公开(公告)号：US10527933B2
公开(公告)日：2020-01-07
申请号：US16176297
申请日：2018-10-31
Applicant: Samsung Display Co., Ltd.
Inventor： Seung-Won Park , Taewoo Kim , Lei Xie , Daehwan Jang , Dae-Young Lee , Gugrae Jo
Abstract: A wire grid polarizer includes a base substrate, a wire grid pattern, a first stitch line extending in a first direction, and a second stitch line extending in a second direction which crosses the first direction, and including a first portion and a second portion which are discontinuous from each other, in which the wire grid pattern is evenly formed on all of the base substrate except where the first and second stitch lines exist, and the first and second stitch lines are where the wire grid pattern is unevenly formed.
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