Invention Grant
- Patent Title: Layout pattern for static random access memory
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Application No.: US15186548Application Date: 2016-06-20
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Publication No.: US10529723B2Publication Date: 2020-01-07
- Inventor: Shu-Wei Yeh , Tsung-Hsun Wu , Chih-Ming Su , Yu-Tse Kuo
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: TW105113803A 20160504
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L27/02

Abstract:
A layout pattern of a static random access memory includes a pull-up device, a first pull-down device, a second pull-up device, a second pull-down device, a first pass gate device and a second pass gate device disposed on a substrate. A plurality of fin structures are disposed on the substrate, and the fin structures include at least one first fin structure and at least one second fin structure. A J-shaped gate structure is disposed on the substrate, including a long part, a short part and a bridge part. At least one first extending contact structure crosses over the at least one first fin structure and the at least one second fin structure, wherein the at least one first extending contact structure does not overlap with the bridge part of the J-shaped gate structure.
Public/Granted literature
- US20170323894A1 LAYOUT PATTERN FOR STATIC RANDOM ACCESS MEMORY Public/Granted day:2017-11-09
Information query
IPC分类: