Invention Grant
- Patent Title: Method for use in process control of manufacture of patterned sample
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Application No.: US15739250Application Date: 2016-06-22
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Publication No.: US10534275B2Publication Date: 2020-01-14
- Inventor: Cornel Bozdog , Aron Cepler , Paul Isbester
- Applicant: NOVA MEASURING INSTRUMENTS LTD.
- Applicant Address: IL Rehovot
- Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee Address: IL Rehovot
- Agency: Alphapatent Associates, Ltd
- Agent Daniel J. Swirsky
- International Application: PCT/IL2016/050667 WO 20160622
- International Announcement: WO2016/207891 WO 20161229
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01N21/956 ; G01N21/21 ; H01L21/66 ; H01L21/8234
Abstract:
A method and system are presented for use in controlling a multiple patterning process of n patterning stages subsequently applied to a sample to produce a target pattern thereon. The method comprises: providing intermediate measured data indicative of an optical response of the sample after being patterned by m-th patterning stage, 1≤m
Public/Granted literature
- US20180196356A1 METHOD FOR USE IN PROCESS CONTROL OF MANUFACTURE OF PATTERNED SAMPLE Public/Granted day:2018-07-12
Information query
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