Invention Grant
- Patent Title: Metallic microstructures with reduced-visibility and methods for producing same
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Application No.: US15320016Application Date: 2015-06-26
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Publication No.: US10537028B2Publication Date: 2020-01-14
- Inventor: Matthew S. Stay , Matthew R. Smith , Mikhail L. Pekurovsky , John T. Strand , Moses M. David , Glen A. Jerry , Ellison G. Kawakami , Karl K. Stensvad , James R. Starkey
- Applicant: 3M INNOVATIVE PROPERTIES COMPANY
- Applicant Address: US MN St. Paul
- Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee: 3M INNOVATIVE PROPERTIES COMPANY
- Current Assignee Address: US MN St. Paul
- Agent Yufeng Dong
- International Application: PCT/US2015/037929 WO 20150626
- International Announcement: WO2016/003792 WO 20160107
- Main IPC: G06F3/041
- IPC: G06F3/041 ; H05K3/06 ; H05K3/22 ; H05K3/04 ; H05K1/02
Abstract:
Electrically conductive patterns formed on a substrate are provided with a reduced visibility. A region of a major surface of the substrate is selectively roughened to form a roughened pattern on the major surface of the substrate. Electrically conductive traces are directly formed on the roughened region and are conformal with the roughened pattern on the major surface of the substrate.
Public/Granted literature
- US20170142841A1 METALLIC MICROSTRUCTURES WITH REDUCED-VISIBILITY AND METHODS FOR PRODUCING SAME Public/Granted day:2017-05-18
Information query
