Invention Grant
- Patent Title: Layout pattern for static random access memory
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Application No.: US16121609Application Date: 2018-09-04
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Publication No.: US10541244B1Publication Date: 2020-01-21
- Inventor: Po-Lin Chen , Tsung-Hsun Wu
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: TW107128432A 20180815
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L27/11 ; G11C11/413 ; H01L27/02 ; G11C11/412 ; H01L27/12

Abstract:
The present invention provides a layout pattern of a static random access memory (SRAM), comprising at least two inverters coupled to each other for storing data, each inverter comprising an L-shaped gate structure on a substrate, the L-shaped gate structure includes a first portion arranged along a first direction and a second portion aligned along a second direction, wherein the first portion crosses a first diffusion region to form a pull-up device, and the first portion crosses a second diffusion region and a third diffusion region to form a pull-down device, and each of the inverters includes a local interconnection layer, crossing the second diffusion region and the third diffusion region.
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