Invention Grant
- Patent Title: Transparent conductive films with embedded metal grids
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Application No.: US15097919Application Date: 2016-04-13
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Publication No.: US10550490B2Publication Date: 2020-02-04
- Inventor: Wendi Li , Arshad Khan
- Applicant: Versitech Limited
- Applicant Address: CN Hong Kong
- Assignee: Versitech Limited
- Current Assignee: Versitech Limited
- Current Assignee Address: CN Hong Kong
- Agency: Saliwanchik, Lloyd & Eisenschenk
- Main IPC: B32B3/00
- IPC: B32B3/00 ; C25D5/54 ; C25D5/02 ; C25D5/48 ; C25D1/04 ; C25D1/08

Abstract:
A transparent conductive film with a metal mesh embedded in a substrate and a method of fabrication thereof is provided. The metal mesh has a cap that is pressed and embedded in a substrate or a deformable material on a substrate, providing superior mechanical stability by mechanical interlocking. The embedding mechanism also provides superior chemical and environmental stability. A fabrication method is provided and includes a vacuum-free and low-cost process for large-volume manufacturing of the transparent conductive film with tunable performance.
Public/Granted literature
- US20160345430A1 TRANSPARENT CONDUCTIVE FILMS WITH EMBEDDED METAL GRIDS Public/Granted day:2016-11-24
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