Invention Grant
- Patent Title: Method of selectively transferring semiconductor device
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Application No.: US15295226Application Date: 2016-10-17
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Publication No.: US10553747B2Publication Date: 2020-02-04
- Inventor: Chih-Chiang Lu , Yi-Ming Chen , Chun-Yu Lin , Ching-Pei Lin , Chung-Hsun Chien , Chien-Fu Huang , Hao-Min Ku , Min-Hsun Hsieh , Tzu-Chieh Hsu
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: Epistar Corporation
- Current Assignee: Epistar Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: H01L33/62
- IPC: H01L33/62 ; H01L21/683 ; H01L33/00

Abstract:
A semiconductor device comprises a substrate, a first semiconductor unit on the substrate, and an first adhesion structure between the substrate and the first semiconductor unit, and directly contacting the first semiconductor unit and the substrate, wherein the first adhesion structure comprises an adhesion layer and a sacrificial layer, and the adhesion layer and the sacrificial layer are made of different materials, and wherein an adhesion between the first semiconductor unit and the adhesion layer is different from that between the first semiconductor unit and the sacrificial layer.
Public/Granted literature
- US20170033259A1 METHOD OF SELECTIVELY TRANSFERRING SEMICONDUCTOR DEVICE Public/Granted day:2017-02-02
Information query
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