Invention Grant
- Patent Title: Raman spectroscopy based measurements in patterned structures
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Application No.: US16062114Application Date: 2016-12-15
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Publication No.: US10564106B2Publication Date: 2020-02-18
- Inventor: Gilad Barak , Yanir Hainick , Yonatan Oren , Vladimir Machavariani
- Applicant: NOVA MEASURING INSTRUMENTS LTD.
- Applicant Address: IL Rehovot
- Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee: NOVA MEASURING INSTRUMENTS LTD.
- Current Assignee Address: IL Rehovot
- Agency: Alphapatent Associates, Ltd
- Agent Daniel J. Swirsky
- International Application: PCT/IL2016/051349 WO 20161215
- International Announcement: WO2017/103934 WO 20170622
- Main IPC: G01N21/65
- IPC: G01N21/65 ; G01B11/06 ; G01N21/95 ; G03F7/20 ; H01L21/66 ; G01L1/24

Abstract:
A method and system are presented for use in measuring one or more characteristics of patterned structures. The method comprises: providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the characteristic(s) to be measured; processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme; analyzing the distribution of Raman-contribution efficiency and determining the characteristic(s) of the structure.
Public/Granted literature
- US20180372644A1 RAMAN SPECTROSCOPY BASED MEASUREMENTS IN PATTERNED STRUCTURES Public/Granted day:2018-12-27
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