Invention Grant
- Patent Title: Charged particle beam apparatus and method for adjusting imaging conditions for the same
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Application No.: US16184107Application Date: 2018-11-08
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Publication No.: US10566172B2Publication Date: 2020-02-18
- Inventor: Tomohito Nakano , Toshiyuki Yokosuka , Yuko Sasaki , Minoru Yamazaki , Yuzuru Mochizuki
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2017-231349 20171201
- Main IPC: H01J37/21
- IPC: H01J37/21 ; H01J37/141 ; H01J37/244 ; H01J37/22 ; H01J37/20 ; H01J37/28

Abstract:
A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.
Public/Granted literature
- US20190172676A1 Charged Particle Beam Apparatus and Method for Adjusting Imaging Conditions for the Same Public/Granted day:2019-06-06
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