Invention Grant
- Patent Title: Lithographic apparatus having an active base frame support
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Application No.: US16062735Application Date: 2016-11-17
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Publication No.: US10578983B2Publication Date: 2020-03-03
- Inventor: Hans Butler , Björn Hubertus Maria Bukkems , Cornelius Adrianus Lambertus De Hoon , Maurice Willem Jozef Etiënne Wijckmans
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Priority: EP15201466 20151221
- International Application: PCT/EP2016/077954 WO 20161117
- International Announcement: WO2017/108284 WO 20170629
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A lithographic apparatus comprises a base frame constructed to form a supporting structure of the lithographic apparatus, an active base frame support arranged between the base frame and a ground floor. The active base frame support is configured to support the base frame on the ground floor. The active base frame support comprises an actuator configured to exert a force in a horizontal direction between the base frame and the ground plane. The lithographic apparatus further comprises a control device configured to drive the actuator, a signal representative of a disturbance force on the base frame being provided to the control device, the control device being configured to drive the actuator using the force sensor signal.
Public/Granted literature
- US20180373156A1 LITHOGRAPHIC APPARATUS HAVING AN ACTIVE BASE FRAME SUPPORT Public/Granted day:2018-12-27
Information query
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