Invention Grant
- Patent Title: X-ray diffractometer
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Application No.: US15622900Application Date: 2017-06-14
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Publication No.: US10585053B2Publication Date: 2020-03-10
- Inventor: Shintaro Kobayashi , Katsuhiko Inaba
- Applicant: Rigaku Corporation
- Applicant Address: JP Akishima-Shi, Tokyo
- Assignee: RIGAKU CORPORATION
- Current Assignee: RIGAKU CORPORATION
- Current Assignee Address: JP Akishima-Shi, Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: JP2016-118860 20160615
- Main IPC: G01N23/207
- IPC: G01N23/207 ; G01N23/20008 ; G01N23/201 ; G01C9/00 ; G21K1/02

Abstract:
An X-ray diffractometer for obtaining X-ray diffraction angles of diffracted X-rays by detecting with an X-ray detector diffracted X-rays diffracted at a sample when X-rays are emitted at the sample at each angle of the angles about a center point of goniometer circles, the X-ray diffractometer having a pinhole member provided with a pinhole, the pinhole allowing X-rays diffracted from the sample to pass so that the diffracted X-rays pass through the center point of the goniometer circle, and other diffracted X-rays are shielded by the pinhole member.
Public/Granted literature
- US20170363550A1 X-RAY DIFFRACTOMETER Public/Granted day:2017-12-21
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