Invention Grant
- Patent Title: Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate
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Application No.: US16207412Application Date: 2018-12-03
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Publication No.: US10586682B2Publication Date: 2020-03-10
- Inventor: Shunsuke Isaji , Rieko Nishimura
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2017-232635 20171204
- Main IPC: H01J37/304
- IPC: H01J37/304 ; H01J37/317 ; H01J37/147 ; H01J37/30 ; H01J37/04

Abstract:
In one embodiment, a method of obtaining a beam deflection shape includes using a plurality of beams to write a line pattern on a substrate by deflecting the plurality of beams, the plurality of beams being beams in the i-th row (i is an integer satisfying 1≤i≤m) among multiple charged-particle beams including beams of m rows and n columns (m and n are integers equal to or greater than two), the deflection being performed in such a manner that a writing area for a beam in the j-th column (j is an integer satisfying 1≤j≤n−1) is continuously adjacent to a writing area for a beam in the (j+1)th column, measuring a degree of unevenness of an edge of the line pattern, and obtaining a deflection shape of the beam based on the degree of unevenness.
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