Invention Grant
- Patent Title: EUV cleaning systems and methods thereof for an extreme ultraviolet light source
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Application No.: US15453884Application Date: 2017-03-08
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Publication No.: US10606180B2Publication Date: 2020-03-31
- Inventor: Marc Guy Langlois
- Applicant: ASML Netherlands, B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Arent Fox LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00
Abstract:
Methods and apparatus for in-situ incline cleaning an element disposed in a EUV generating chamber are disclosed. A capillary-based hydrogen radical generator is employed to form hydrogen radicals from hydrogen gas. The capillary-based hydrogen radical generator is resistively heated during operation and is oriented such that hydrogen radicals catalytically generated from the hydrogen gas are directed to a surface of the element to clean the surface.
Public/Granted literature
- US20180259861A1 EUV CLEANING SYSTEMS AND METHODS THEREOF FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE Public/Granted day:2018-09-13
Information query
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