Invention Grant
- Patent Title: Variable depth edge ring for etch uniformity control
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Application No.: US15422823Application Date: 2017-02-02
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Publication No.: US10651015B2Publication Date: 2020-05-12
- Inventor: Ivelin Angelov , Cristian Siladie , Dean Larson , Brian Severson
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: LAM RESEARCH CORPORATION
- Current Assignee: LAM RESEARCH CORPORATION
- Current Assignee Address: US CA Fremont
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/32

Abstract:
A substrate support includes an inner portion arranged to support a substrate, an edge ring surrounding the inner portion, and a controller that calculates a desired pocket depth of the substrate support. Pocket depth corresponds to a distance between an upper surface of the edge ring and an upper surface of the substrate. Based on the desired pocket depth, the controller selectively controls an actuator to raise and lower at least one of the edge ring and the inner portion to adjust the distance between the upper surface of the edge ring and the upper surface of the substrate.
Public/Granted literature
- US20170236741A1 VARIABLE DEPTH EDGE RING FOR ETCH UNIFORMITY CONTROL Public/Granted day:2017-08-17
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