Invention Grant
- Patent Title: Substrate with transparent electrode and method for manufacturing same
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Application No.: US15880470Application Date: 2018-01-25
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Publication No.: US10662521B2Publication Date: 2020-05-26
- Inventor: Hironori Hayakawa , Takashi Kuchiyama , Kenji Yamamoto
- Applicant: KANEKA CORPORATION
- Applicant Address: JP Osaka-shi, Osaka
- Assignee: KANEKA CORPORATION
- Current Assignee: KANEKA CORPORATION
- Current Assignee Address: JP Osaka-shi, Osaka
- Agency: Alleman Hall Creasman & Tuttle LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7249361d
- Main IPC: B32B15/04
- IPC: B32B15/04 ; B32B17/06 ; C23C14/34 ; H05K1/09 ; C23C14/08 ; G06F3/044 ; H05K3/16

Abstract:
A substrate with a transparent electrode which includes an amorphous transparent electrode layer on a transparent film substrate. When a bias voltage of 0.1 V is applied to the amorphous transparent electrode layer, the layer has continuous regions where a current value at a voltage-applied surface is 50 nA or more. Each of the continuous regions has an area of 100 nm2 or more and the number of the continuous regions is 50/μm2 or more. In one embodiment, the layer has a tin oxide content of 6.5% or more and 8% or less by mass. With respect to the substrate with a transparent electrode according to the present invention, the transparent electrode layer may be crystallized in a short period of time.
Public/Granted literature
- US20180187300A1 SUBSTRATE WITH TRANSPARENT ELECTRODE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2018-07-05
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