Invention Grant
- Patent Title: Method of removing debris from a liquid photopolymer in an additive fabrication device
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Application No.: US15791926Application Date: 2017-10-24
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Publication No.: US10668665B2Publication Date: 2020-06-02
- Inventor: Adam Damiano , Andre Comella
- Applicant: Formlabs, Inc.
- Applicant Address: US MA Somerville
- Assignee: Formlabs, Inc.
- Current Assignee: Formlabs, Inc.
- Current Assignee Address: US MA Somerville
- Agency: Wolf, Greenfield & Sacks, P.C.
- Main IPC: B01D37/00
- IPC: B01D37/00 ; B29C64/35 ; B29C64/393 ; B29C64/129 ; B33Y50/02 ; B29C64/227 ; B33Y40/00 ; B33Y10/00 ; B29C64/124 ; B01D39/16 ; B01J8/00 ; B29L31/14 ; B29L31/00 ; B29C37/00

Abstract:
According to some aspects, a method is provided of removing debris from a liquid photopolymer in an additive fabrication device. According to some embodiments, a mesh of solid material may be formed in an additive fabrication device from a liquid photopolymer, and particles of debris present in the liquid photopolymer may adhere to the mesh. The debris may thereby be removed from the liquid photopolymer by removing the mesh from the additive fabrication device. The mesh may then be discarded.
Public/Granted literature
- US20190118476A1 TECHNIQUES FOR DEBRIS REMOVAL IN STEREOLITHOGRAPHY AND RELATED SYSTEMS AND METHODS Public/Granted day:2019-04-25
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