-
公开(公告)号:US20220363001A1
公开(公告)日:2022-11-17
申请号:US17828293
申请日:2022-05-31
Applicant: Formlabs, Inc.
Inventor: Adam Damiano , Andre Comella
IPC: B29C64/35 , B29C64/393 , B29C64/129 , B33Y50/02 , B29C64/227 , B33Y40/00 , B33Y10/00 , B29C64/124 , B01D39/16 , B01J8/00
Abstract: According to some aspects, a method is provided of removing debris from a liquid photopolymer in an additive fabrication device. According to some embodiments, a mesh of solid material may be formed in an additive fabrication device from a liquid photopolymer, and particles of debris present in the liquid photopolymer may adhere to the mesh. The debris may thereby be removed from the liquid photopolymer by removing the mesh from the additive fabrication device. The mesh may then be discarded.
-
公开(公告)号:US11897199B2
公开(公告)日:2024-02-13
申请号:US17828293
申请日:2022-05-31
Applicant: Formlabs, Inc.
Inventor: Adam Damiano , Andre Comella
IPC: B01D37/00 , B29C64/135 , B33Y40/20 , B29C64/35 , B29C64/393 , B29C64/129 , B33Y50/02 , B29C64/227 , B33Y10/00 , B29C64/124 , B01D39/16 , B01J8/00 , B33Y40/10 , B33Y40/00 , B01D29/00 , B29L31/14 , B29L31/00 , B29C37/00
CPC classification number: B29C64/35 , B01D29/0093 , B01D39/1623 , B01J8/006 , B29C64/124 , B29C64/129 , B29C64/227 , B29C64/393 , B33Y10/00 , B33Y40/00 , B33Y40/10 , B33Y50/02 , B29C2037/96 , B29L2031/14 , B29L2031/737
Abstract: According to some aspects, a method is provided of removing debris from a liquid photopolymer in an additive fabrication device. According to some embodiments, a mesh of solid material may be formed in an additive fabrication device from a liquid photopolymer, and particles of debris present in the liquid photopolymer may adhere to the mesh. The debris may thereby be removed from the liquid photopolymer by removing the mesh from the additive fabrication device. The mesh may then be discarded.
-
3.
公开(公告)号:US10668665B2
公开(公告)日:2020-06-02
申请号:US15791926
申请日:2017-10-24
Applicant: Formlabs, Inc.
Inventor: Adam Damiano , Andre Comella
IPC: B01D37/00 , B29C64/35 , B29C64/393 , B29C64/129 , B33Y50/02 , B29C64/227 , B33Y40/00 , B33Y10/00 , B29C64/124 , B01D39/16 , B01J8/00 , B29L31/14 , B29L31/00 , B29C37/00
Abstract: According to some aspects, a method is provided of removing debris from a liquid photopolymer in an additive fabrication device. According to some embodiments, a mesh of solid material may be formed in an additive fabrication device from a liquid photopolymer, and particles of debris present in the liquid photopolymer may adhere to the mesh. The debris may thereby be removed from the liquid photopolymer by removing the mesh from the additive fabrication device. The mesh may then be discarded.
-
公开(公告)号:US11383442B2
公开(公告)日:2022-07-12
申请号:US16867839
申请日:2020-05-06
Applicant: Formlabs, Inc.
Inventor: Adam Damiano , Andre Comella
IPC: B01D37/00 , B33Y80/00 , B29C64/35 , B29C64/393 , B29C64/129 , B33Y50/02 , B29C64/227 , B33Y40/00 , B33Y10/00 , B29C64/124 , B01D39/16 , B01J8/00 , B29L31/14 , B29L31/00 , B29C37/00
Abstract: According to some aspects, a method is provided of removing debris from a liquid photopolymer in an additive fabrication device. According to some embodiments, a mesh of solid material may be formed in an additive fabrication device from a liquid photopolymer, and particles of debris present in the liquid photopolymer may adhere to the mesh. The debris may thereby be removed from the liquid photopolymer by removing the mesh from the additive fabrication device. The mesh may then be discarded.
-
5.
公开(公告)号:US20200269508A1
公开(公告)日:2020-08-27
申请号:US16867839
申请日:2020-05-06
Applicant: Formlabs, Inc.
Inventor: Adam Damiano , Andre Comella
IPC: B29C64/35 , B29C64/393 , B29C64/129 , B33Y50/02 , B29C64/227 , B33Y40/00 , B33Y10/00 , B29C64/124 , B01D39/16 , B01J8/00
Abstract: According to some aspects, a method is provided of removing debris from a liquid photopolymer in an additive fabrication device. According to some embodiments, a mesh of solid material may be formed in an additive fabrication device from a liquid photopolymer, and particles of debris present in the liquid photopolymer may adhere to the mesh. The debris may thereby be removed from the liquid photopolymer by removing the mesh from the additive fabrication device. The mesh may then be discarded.
-
公开(公告)号:US20190118476A1
公开(公告)日:2019-04-25
申请号:US15791926
申请日:2017-10-24
Applicant: Formlabs, Inc.
Inventor: Adam Damiano , Andre Comella
IPC: B29C64/35 , B29C64/393 , B29C64/227 , B33Y50/02 , B29C64/129
Abstract: According to some aspects, a method is provided of removing debris from a liquid photopolymer in an additive fabrication device. According to some embodiments, a mesh of solid material may be formed in an additive fabrication device from a liquid photopolymer, and particles of debris present in the liquid photopolymer may adhere to the mesh. The debris may thereby be removed from the liquid photopolymer by removing the mesh from the additive fabrication device. The mesh may then be discarded.
-
-
-
-
-