Invention Grant
- Patent Title: Apparatus for removing particles from a twin chamber processing system
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Application No.: US13962575Application Date: 2013-08-08
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Publication No.: US10672591B2Publication Date: 2020-06-02
- Inventor: Andrew Nguyen , Tom K. Cho , Kartik Ramaswamy , Yogananda Sarode Vishwanath
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/67 ; C23C16/44 ; C23C16/455 ; C23C16/48 ; B08B7/00

Abstract:
Embodiments of an apparatus for removing particles from a twin chamber processing system are provided herein. In some embodiments, an apparatus for removing particles from a twin chamber processing system includes a remote plasma system; and a plurality of conduits fluidly coupling the remote plasma system to each process chamber of a twin chamber processing system to provide a plasma to an exhaust volume of each process chamber, wherein each conduit of the plurality of conduits has an outlet disposed along a boundary of the respective exhaust volumes.
Public/Granted literature
- US20140374024A1 APPARATUS FOR REMOVING PARTICLES FROM A TWIN CHAMBER PROCESSING SYSTEM Public/Granted day:2014-12-25
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