Invention Grant
- Patent Title: Inspection method and system
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Application No.: US16160958Application Date: 2018-10-15
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Publication No.: US10679340B2Publication Date: 2020-06-09
- Inventor: Wei Fang , Zhao-Li Zhang , Jack Jau
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Hennderson, Farabow Garrett & Dunner LLP
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06T7/00 ; G06K9/46

Abstract:
An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.
Public/Granted literature
- US20190147579A1 INSPECTION METHOD AND SYSTEM Public/Granted day:2019-05-16
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