Invention Grant
- Patent Title: Optimal exposure of a bottom surface of a substrate material and/or edges thereof for cleaning in a spin coating device
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Application No.: US16459613Application Date: 2019-07-02
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Publication No.: US10679844B2Publication Date: 2020-06-09
- Inventor: Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
- Applicant: Thanh Truong , Tri Dang , Tu Tran , Hieu Charlie Nguyen
- Applicant Address: US CA San Jose
- Assignee: C&D SEMICONDUCTOR SERVICES, INC.
- Current Assignee: C&D SEMICONDUCTOR SERVICES, INC.
- Current Assignee Address: US CA San Jose
- Agency: Legalforce RAPC Worldwide
- Main IPC: H01L21/02
- IPC: H01L21/02 ; G03F7/16 ; B05C11/08 ; H01L21/67 ; B08B3/02 ; H01L21/687

Abstract:
A spin coating device includes a base plate, a spin chuck on which a substrate material is placed, and an actuator mechanism to engage the base plate with the spin chuck such that the base plate synchronously spins along with the spin chuck. The substrate material includes a top surface coated with a film-forming substance and a bottom surface. The cleaning mechanism is below the base plate and out of optimal exposure to the bottom surface and edges of the substrate material in a state of base plate engagement. In response to disengagement of a lid configured to synchronously co-rotate with the base plate, the actuator mechanism is further configured to disengage the base plate from the spin chuck and to enable the optimal exposure of the cleaning mechanism to the bottom surface and the edges of the substrate material.
Public/Granted literature
Information query
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