Invention Grant
- Patent Title: Reference sample with inclined support base, method for evaluating scanning electron microscope, and method for evaluating SiC substrate
-
Application No.: US16096443Application Date: 2017-04-27
-
Publication No.: US10699873B2Publication Date: 2020-06-30
- Inventor: Tadaaki Kaneko , Koji Ashida
- Applicant: KWANSEI GAKUIN EDUCATIONAL FOUNDATION
- Applicant Address: JP Nishinomiya-shi
- Assignee: KWANSEI GAKUIN EDUCATIONAL FOUNDATION
- Current Assignee: KWANSEI GAKUIN EDUCATIONAL FOUNDATION
- Current Assignee Address: JP Nishinomiya-shi
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@47fc1735
- International Application: PCT/JP2017/016737 WO 20170427
- International Announcement: WO2017/188380 WO 20171102
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J37/20 ; H01J37/28 ; G01N1/00 ; H01J37/22

Abstract:
A reference sample (41) has a step/terrace structure made of monocrystalline SiC and a surface of each terrace has first or second stack orientation. In the reference sample (41), contrast as difference in lightness and darkness between an image of a terrace with a surface directly under which the first stack orientation lies and an image of a terrace with a surface directly under which the second stack orientation lies changes according to an incident electron angle which is an angle that an electron beam emitted from a scanning electron microscope forms with a perpendicular to the terrace surface. Even when a SiC substrate has an off angle (e.g., from 1° to 8°), using an inclined support base (20a) capable of correcting the off angle enables sharp contrast that reflects difference between the first and second stack orientations directly under the surface to be obtained irrespective of the off angle.
Public/Granted literature
Information query