Invention Grant
- Patent Title: Deposition and treatment of films for patterning
-
Application No.: US16394731Application Date: 2019-04-25
-
Publication No.: US10699952B2Publication Date: 2020-06-30
- Inventor: Atashi Basu , Abhijit Basu Mallick , Ziqing Duan , Srinivas Gandikota
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/768
- IPC: H01L21/768 ; H01L21/02 ; H01L21/033 ; H01L21/762 ; H01L21/3213 ; H01L21/266
Abstract:
Methods comprising depositing a film material to form an initial film in a trench in a substrate surface are described. The film is treated to expand the film to grow beyond the substrate surface.
Public/Granted literature
- US20190252252A1 Deposition And Treatment Of Films For Patterning Public/Granted day:2019-08-15
Information query
IPC分类:
