- Patent Title: Film manufacturing method, film manufacturing apparatus, and film
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Application No.: US15770793Application Date: 2016-10-31
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Publication No.: US10707465B2Publication Date: 2020-07-07
- Inventor: Akihiko Shin , Atsuhiro Takata
- Applicant: Sumitomo Chemical Company, Limited
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Panitch Schwarze Belisario & Nadel LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@daaa3c7
- International Application: PCT/JP2016/082349 WO 20161031
- International Announcement: WO2017/073788 WO 20170504
- Main IPC: H01M2/14
- IPC: H01M2/14 ; B05D3/02 ; B32B27/32 ; B32B27/34 ; H01M2/16 ; C08J5/18 ; C08J7/04 ; B05D7/04 ; B32B38/00

Abstract:
A method of producing a film is provided. The film includes a base material layer which is shrunk by heat and a functional layer which is dried while being restricted by the base material layer. The method involves heating the film while applying a tensile force in a direction of a length of the film so as to convey the film, and subjecting the film to a heat treatment while, in a distribution along a width of the film, a center part is higher in temperature than end parts. A center part sample of the film is smaller in curling amount with respect to the width of the film than an end part sample, or a standard deviation in curling amount with respect to the width is not more than 1 mm between two samples from respective end parts and a sample from the center part of the film.
Public/Granted literature
- US20180309104A1 FILM MANUFACTURING METHOD, FILM MANUFACTURING APPARATUS, AND FILM Public/Granted day:2018-10-25
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