Invention Grant
- Patent Title: Plasma processing method
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Application No.: US16154930Application Date: 2018-10-09
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Publication No.: US10714356B2Publication Date: 2020-07-14
- Inventor: Shogo Okita , Atsushi Harikai , Akihiro Itou , Noriyuki Matsubara
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Current Assignee Address: JP Osaka
- Agency: Pearne & Gordon LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@f1f85ee
- Main IPC: H01L21/306
- IPC: H01L21/306 ; H01L21/3065 ; H01L21/67 ; H01L21/683 ; H01L21/677 ; H01L21/687 ; H01L21/311 ; H01J37/00
Abstract:
Provided is a plasma processing method which comprises steps of preparing a conveying carrier including a holding sheet and a frame provided on a peripheral region of the holding sheet, adhering the substrate on the holding sheet in an inner region inside the peripheral region to hold the substrate on the conveying carrier, sagging the holding sheet in the inner region, setting the conveying carrier on a stage provided within a plasma processing apparatus to contact the holding sheet on the stage so that the holding sheet in the inner region touches the stage before the holding sheet in the peripheral region does, and plasma processing the substrate.
Public/Granted literature
- US20190122892A1 PLASMA PROCESSING METHOD Public/Granted day:2019-04-25
Information query
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